The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2008
Filed:
Jun. 02, 2004
Jeffrey L. Solomon, Vadnais Heights, MN (US);
Michael C. Lea, Bracknell, GB;
Richard C. Allen, Lilydale, MN (US);
Jeffrey L. Solomon, Vadnais Heights, MN (US);
Michael C. Lea, Bracknell, GB;
Richard C. Allen, Lilydale, MN (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
A light exposure system is used to expose an alignment layer formed of anistropically absorbing molecules so as to allow alignment of subsequently applied liquid crystal polymer (LCP) molecules. The light incident on the alignment layer is polarized. When a single polarizer is used, the azimuthal polarization direction varies across the substrate carrying the alignment layer. Various approaches to reducing the azimuthal polarization variation may be adopted, including the introduction of various types of polarization rotation reduction element and in selecting an appropriate tilt angle for the light source. Furthermore, a reflective structure may be inserted between the light source and the alignment layer. Use of the reflective structure increases the total amount of light incident on the alignment layer.