The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2008
Filed:
Feb. 16, 2006
Gi-chung Kwon, Gyunggi-do, KR;
Sang-won Lee, Daejeon, KR;
Sae-hoon Uhm, Gyunggi-do, KR;
Jae-hyun Kim, Daejeon, KR;
Bo-han Hong, Daejeon, KR;
Yong-kwan Lee, Daejeon, KR;
Gi-Chung Kwon, Gyunggi-do, KR;
Sang-Won Lee, Daejeon, KR;
Sae-Hoon Uhm, Gyunggi-do, KR;
Jae-Hyun Kim, Daejeon, KR;
Bo-Han Hong, Daejeon, KR;
Yong-Kwan Lee, Daejeon, KR;
Jusung Engineering Co., Ltd., Gyunggi-Do, KR;
Abstract
A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, including: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.