The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Jan. 08, 2003
Yung-chieh Hsieh, San Jose, CA (US);
Chiayu Ai, Newark, CA (US);
Yung-Chieh Hsieh, San Jose, CA (US);
Chiayu Ai, Newark, CA (US);
Other;
Abstract
The cavity in the mirror arm of a conventional interleaver is replaced by a wedge integral with the beamsplitter structure of the interleaver. Thus, the light reflected from the AR-coated surface of the wedge is dispersed away from the optics of the device. The beam emerging from the wedge surface is directed toward a tilted mirror that reflects it totally on-axis. As a result of the diversion of the light reflected from the wedge surface and the non-parallel disposition of the wedge surface with respect to the mirror, phase errors are virtually eliminated. In another embodiment, a second wedge is used with a second antireflective surface disposed in parallel to the first wedge's antireflective surface, and with a mirror normal to the optical axis of the device.