The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Sep. 15, 2005
Peter Wiedemuth, Herbolzheim, DE;
Stefan Schirmaier, Freiburg, DE;
Markus Winterhalter, Bad Krozingen, DE;
Peter Wiedemuth, Herbolzheim, DE;
Stefan Schirmaier, Freiburg, DE;
Markus Winterhalter, Bad Krozingen, DE;
Huettinger Elektronik GmbH + Co. KG, Freiburg, DE;
Abstract
A method of generating an output DC voltage of a gas discharge process voltage supply unit, in which in a first voltage transformation stage a first DC voltage is transformed into a second DC voltage of a predetermined voltage range, and the output DC voltage is generated from the second DC voltage in a second voltage transformation stage. A switching element of at least one boost converter is switched with a controlled pulse-duty factor for generating the output DC voltage in the second voltage transformation stage. This method permits striking and maintenance of a plasma process.