The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7408297 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 05, 2008

Filed:

Mar. 18, 2003
Applicants:

Chao-nan Xu, Shukumachi Tosu Saga, JP;

Hiroshi Tateyama, Shukumachi Tosu Saga, JP;

Inventors:

Chao-Nan Xu, Shukumachi Tosu Saga, JP;

Hiroshi Tateyama, Shukumachi Tosu Saga, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 33/00 (2006.01); H05B 33/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A stacked structure () includes an electrostriction layer () including an electric inductive distortion material and a stress light-emitting layer () including a stress light-emitting material. When applying a voltage to the electrostriction layer () in the stacked structure (), the electric inductive distortion material deforms, thereby the electrostriction layer () deforms. The deformation of the electrostriction layer () causes an external force to act on the stress light-emitting material of the stress light-emitting layer (), and the stress light-emitting layer () emits light, accordingly. That is, by applying the voltage to the stacked structure (), the stacked structure () can emit the light.


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