The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Aug. 24, 2006
Alex A. Behfar, Ithaca, NY (US);
Wilfried Lenth, Santa Cruz, CA (US);
Alex A. Behfar, Ithaca, NY (US);
Wilfried Lenth, Santa Cruz, CA (US);
Binoptics Corporation, Ithaca, NY (US);
Abstract
A method and structure for producing lasers having good optical wavefront characteristics, such as are needed for optical storage includes providing a laser wherein an output beam emerging from the laser front facet is essentially unobstructed by the edges of the semiconductor chip in order to prevent detrimental beam distortions. The semiconductor laser structure is epitaxially grown on a substrate with at least a lower cladding layer, an active layer, an upper cladding layer, and a contact layer. Dry etching through a lithographically defined mask produces a laser mesa of length land width b. Another sequence of lithography and etching is used to form a ridge structure with width w on top of the mesa. The etching step also forming mirrors, or facets, on the ends of the laser waveguide structures. The length land width bof the chip can be selected as convenient values equal to or longer than the waveguide length land mesa width b, respectively. The waveguide length and width are selected so that for a given defect density D, the yield Yis larger than 50%.