The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2008

Filed:

Apr. 25, 2005
Applicants:

Luca Dal Negro, Cambridge, MA (US);

Jae Hyung Yi, Cambridge, MA (US);

Jurgen Michel, Arlington, MA (US);

Yasha Yi, Cambridge, MA (US);

Victor T. Nguyen, Walnut, CA (US);

Lionel C. Kimerling, Concord, MA (US);

Inventors:

Luca Dal Negro, Cambridge, MA (US);

Jae Hyung Yi, Cambridge, MA (US);

Jurgen Michel, Arlington, MA (US);

Yasha Yi, Cambridge, MA (US);

Victor T. Nguyen, Walnut, CA (US);

Lionel C. Kimerling, Concord, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01);
U.S. Cl.
CPC ...
Abstract

A fabrication method and materials produce high quality aperiodic photonic structures. Light emission can be activated by thermal annealing post growth treatments when thin film layers of SiOand SiNor Si-rich oxide are used. From these aperiodic structures, that can be obtained in different vertical and planar device geometries, the presence of aperiodic order in a photonic device provides strong group velocity reduction (slow photons), enhanced light-matter interaction, light emission enhancement, gain enhancement, and/or nonlinear optical properties enhancement.


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