The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2008
Filed:
Mar. 11, 2005
Takuo Kaitoh, Mobara, JP;
Eiji Oue, Mobara, JP;
Takahiro Kamo, Chiba, JP;
Yasukazu Kimura, Chiba, JP;
Toshihiko Itoga, Chiba, JP;
Takuo Kaitoh, Mobara, JP;
Eiji Oue, Mobara, JP;
Takahiro Kamo, Chiba, JP;
Yasukazu Kimura, Chiba, JP;
Toshihiko Itoga, Chiba, JP;
Hitachi Displays, Ltd., Mobara-Shi, JP;
Abstract
The invention provides a method of manufacture of a display device which can achieve a reduction of the manufacturing process. In the manufacturing method, a semiconductor layer is formed over an upper surface of a substrate. An insulation film is formed over an upper surface of the semiconductor layer. Using a mask which covers a first region and exposes a second region, an implantation of impurities into the semiconductor layer is performed in the second region through the insulation film. After the mask is removed, a surface of the insulation film is etched in the first region and the second region to an extent that the insulation film in the second region remains, whereby the film thickness of the insulation film in the second region is set to be smaller than the film thickness of the insulation film in the first region.