The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2008

Filed:

Dec. 16, 2003
Applicants:

Gary B. Josephson, Richland, WA (US);

Delbert L. Lessor, Richland, WA (US);

Amit K. Sharma, Burlington, NJ (US);

Christopher Lyle Aardahl, Richland, WA (US);

Kenneth G. Rappe, Richland, WA (US);

Inventors:

Gary B. Josephson, Richland, WA (US);

Delbert L. Lessor, Richland, WA (US);

Amit K. Sharma, Burlington, NJ (US);

Christopher Lyle Aardahl, Richland, WA (US);

Kenneth G. Rappe, Richland, WA (US);

Assignee:

Battelle Memorial Institute, Richland, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.


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