The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2008

Filed:

Sep. 09, 2004
Applicants:

Tomomi Funayama, Hino, JP;

Masayuki Takagishi, Kunitachi, JP;

Katsuhiko Koui, Yokohama, JP;

Kohichi Tateyama, Yokohama, JP;

Inventors:

Tomomi Funayama, Hino, JP;

Masayuki Takagishi, Kunitachi, JP;

Katsuhiko Koui, Yokohama, JP;

Kohichi Tateyama, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/33 (2006.01);
U.S. Cl.
CPC ...
Abstract

A magnetoresistance effect element of the dual spin valve type using a current-perpendicular-to-the-plane (CPP) system where a sensing current flows perpendicular to the stacked faces of a plurality of conductive layers, the magnetoresistance effect element comprises a first unit which includes a free layer and a first pinning layer, a second unit which includes the free layer shared with the first unit and a second pinning layer, a first current control layer which is provided in the first unit and limits the flow quantity of the sensing current, and a second current control layer which is provided in the second unit and limits the flow quantity of the sensing current.


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