The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Jan. 30, 2006
Gregory J. Wells, Fairfield, CA (US);
Gregory J. Wells, Fairfield, CA (US);
Varian, Inc., Palo Alto, CA (US);
Abstract
Methods for applying an RF field in a two-dimensional electrode structure include applying RF voltages to one or more main electrodes and compensation electrodes. The voltages on the one or more compensation electrodes may be adjusted to be proportional to the voltages on the main electrodes. The adjustment(s) may be done to optimize the RF field for different modes of operation such as ion ejection and ion dissociation. For dissociation and other procedures involving ion excitation, the voltages applied to the one or more compensation electrodes may be different from the voltages applied to the one or more main electrodes. Electrode structures may include main trapping electrodes, one or more compensation electrodes, one or more ion exit apertures, and a device or circuitry for applying the various desired voltages.