The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2008
Filed:
Mar. 22, 2005
Vincent Patrick Labella, Cohoes, NY (US);
Martin Bolduc, Albany, NY (US);
Chaffra Adeyandju Awo-affouda, Albany, NY (US);
Mengbing Huang, Guilderland, NY (US);
Vincent Patrick LaBella, Cohoes, NY (US);
Martin Bolduc, Albany, NY (US);
Chaffra Adeyandju Awo-Affouda, Albany, NY (US);
Mengbing Huang, Guilderland, NY (US);
The Research Foundation of State University of New York, Albany, NY (US);
Abstract
A manganese-implanted silicon substrate exhibits ferromagnetism and a Curie temperature above room temperature when magnetized. The implant is done at a temperature of between about 250 C and about 800 C, while the manganese concentration is between about 0.01 atomic percent and 10 atomic percent. The silicon substrate can be p- or n-type with a doping concentration between 10and 10cm. Annealing may be done to increase the saturation magnetization.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile