The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2008

Filed:

May. 09, 2006
Applicants:

Chi Hung Huang, Hsin-Chu, TW;

Hsien-i You, Hsin-Chu, TW;

Mao-yuan Shih, Hsin-Chu, TW;

Chien-jen Chen, Hsin-Chu, TW;

Inventors:

Chi Hung Huang, Hsin-Chu, TW;

Hsien-I You, Hsin-Chu, TW;

Mao-Yuan Shih, Hsin-Chu, TW;

Chien-Jen Chen, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 1/24 (2006.01); G01B 11/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A novel method for whole field thin film stress evaluation is provided. Through the provided method, the whole filed thin film stress distribution for an optical thin film would be developed with a commercial interferometer, so that a whole field evaluation for the crack or peel-off of thin film is hence achievable.


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