The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2008
Filed:
Sep. 14, 2005
Applicants:
Hee-jung Kim, Daejeon, KR;
Dong-ryul Kim, Daejeon, KR;
Sang-uk Ryu, Daejeon, KR;
Sang-hyun Park, Daejeon, KR;
Inventors:
Hee-jung Kim, Daejeon, KR;
Dong-ryul Kim, Daejeon, KR;
Sang-uk Ryu, Daejeon, KR;
Sang-hyun Park, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 63/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for preparing polyarylate wherein a bivalent phenol compound having the structure of Formula 1 and an aromatic dicarboxylic acid halogen compound react to prepare a polyarylate, and wherein a nonionic surface-active agent is added. This decreases residual salts and improves the transmittance and the heat-resistance. In Formula 1, R1, R2, R3 and R4 denote the same as illustrated in the description.