The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2008

Filed:

Mar. 23, 2007
Applicants:

Timothy D. Shaffer, Hackettstown, NJ (US);

Michael F. Mcdonald, Kingwood, TX (US);

David Y. Chung, Bellaire, TX (US);

Robert N. Webb, Kingwood, TX (US);

Deborah J. Davis, Pasadena, TX (US);

Pamela J. Wright, Easton, PA (US);

Inventors:

Timothy D. Shaffer, Hackettstown, NJ (US);

Michael F. McDonald, Kingwood, TX (US);

David Y. Chung, Bellaire, TX (US);

Robert N. Webb, Kingwood, TX (US);

Deborah J. Davis, Pasadena, TX (US);

Pamela J. Wright, Easton, PA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/12 (2006.01); C08F 4/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

The disclosure provides a slurry polymerization system and method to decrease polymer deposition on reactor surfaces using an oxygenate such as alcohol () supplied to the polymerization medium () separate from the catalyst feed ().


Find Patent Forward Citations

Shaffer, Timothy. (2008). Method and apparatus for decreasing polymer deposition (U.S. Patent No. 7402636). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7402636

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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