The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2008

Filed:

Jul. 28, 2005
Applicant:

Jae Won Hahn, Seoul, KR;

Inventor:

Jae Won Hahn, Seoul, KR;

Assignee:

Yonsei University, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A two-dimensional light-modulating fine aperture array apparatus includes a spatial light-modulating unit for adjusting quantity of incident light by using a plurality of light amount adjusting cells (liquid crystal cells or micromirrors) arrayed in matrix form, a two-dimensional microlens array having microlenses which focus light beams passing through the light quantity adjusting cells, and a highly efficient two-dimensional fine aperture array. The light is emitted through the fine apertures by connecting the two-dimensional light-modulating fine aperture array apparatus with a light source unit. A scanning unit moves in the x and y directions to perform a scanning process on a surface of a recording medium by using the light emitted from the apertures.


Find Patent Forward Citations

Hahn, Jae. (2008). Two-dimensional light-modulating nano/micro aperture array and high-speed nano pattern recording system utilized with the array (U.S. Patent No. 7400380). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7400380

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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