The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2008

Filed:

Jan. 05, 2005
Applicants:

Steven Alan Lipp, West Windsor, NJ (US);

Joseph H. Abeles, East Brunswick, NJ (US);

Alan Michael Braun, Lawrenceville, NJ (US);

Sterling Eduard Mcbride, Princeton, NJ (US);

John P. Riganati, Skillman, NJ (US);

Ralph Doud Whaley, Jr., Princeton Junction, NJ (US);

Peter J. Zanzucchi, Princeton Junction, NJ (US);

Inventors:

Steven Alan Lipp, West Windsor, NJ (US);

Joseph H. Abeles, East Brunswick, NJ (US);

Alan Michael Braun, Lawrenceville, NJ (US);

Sterling Eduard McBride, Princeton, NJ (US);

John P. Riganati, Skillman, NJ (US);

Ralph Doud Whaley, Jr., Princeton Junction, NJ (US);

Peter J. Zanzucchi, Princeton Junction, NJ (US);

Assignee:

Sarnoff Corporation, Princeton, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 1/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cell suitable for use with an atomic clock and a method for making the same, the cell including: a silicon wafer having a recess formed therein; at least one amorphous silicate member having an ion mobility and temperature expansion coefficient approximately that of silicon sealing the recess; and, an alkali metal containing component and buffer gas contained in the recess. The method includes: providing a silicon wafer; forming a cavity through the silicon wafer; introducing an alkali metal containing component and buffer gas into the cavity; and, anodically bonding at least one amorphous silicate member having an ion mobility and temperature expansion coefficient approximately that of silicon to the wafer to close the cavity.


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