Method and apparatus for performing highly accurate thin film measurements

Abstract

A reflectometer data reduction technique is provided that utilizes a ratio of an expected reflectance spectrum of the sample being measured to the actual reflectance spectrum of the sample being measured. The technique is particularly useful in spectral regions that contain sharp spectral features, for example such as the sharp features that thin films often exhibited in the VUV region. In this manner sharp spectral features, for example resulting from either interference or absorption effects are advantageously utilized to better determine a data minimum that is indicative of an actual measurement value. The derivative of this ratio may be utilized to accentuate sharp spectral features. The data reduction techniques may further utilize a two step approach first using a low resolution difference based technique and then a high resolution technique based on reflectance ratios in the region of interest initially identified by the low resolution technique.