The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2008

Filed:

Aug. 13, 2002
Applicants:

Christopher Plummer, Echanders, CH;

Laszlo Garamszegi, Lausanne, CH;

Yves Leterrier, Lausanne, CH;

Marlene Rodlert, St. Sulpice, CH;

Jan-anders E. Manson, Chexbres, CH;

Inventors:

Christopher Plummer, Echanders, CH;

Laszlo Garamszegi, Lausanne, CH;

Yves Leterrier, Lausanne, CH;

Marlene Rodlert, St. Sulpice, CH;

Jan-Anders E. Manson, Chexbres, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08K 3/34 (2006.01); C08K 9/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

Intercalates and exfoliates formed from layered materials and dendritic polymers are disclosed, together with the uses of these materials, e.g. in producing composite materials. The dispersion of layered materials in a dendritic polymer matrix (hyperbranched polymers, star shaped polymers or star branched polymers) or has not been disclosed in the prior art. The high number of end-groups per molecule of dendritic polymer combined with their unique globular architectures leads to large intergallery spacings when intercalated in layered silicates and particularly facile exfoliation in spite of the high molar mass of the dendritic polymer. The excellent processability and potential high reactivity of dendritic polymers makes them extremely promising for thermoset applications, and coatings.


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