The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
Feb. 09, 2004
Hitoshi Yamato, Takarazuka, JP;
Toshikage Asakura, Minoo, JP;
Akira Matsumoto, Hyogo, JP;
Peter Murer, Allschwil, CH;
Tobias Hintermann, Basel, CH;
Hitoshi Yamato, Takarazuka, JP;
Toshikage Asakura, Minoo, JP;
Akira Matsumoto, Hyogo, JP;
Peter Murer, Allschwil, CH;
Tobias Hintermann, Basel, CH;
Ciba Specialty Chemicals Corporation, Tarrytown, NY (US);
Abstract
Compounds of the formula (I) or (II) wherein Ris C-Chaloalkylsulfonyl, halobenzenesulfonyl, C- Chaloalkanoyl, halobenzoyl; Ris halogen or C-Chaloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar'is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D-D-phenylene or —Ar′-A—Y-A—Ar′—; wherein these radicals optionally are substituted; Ae′, is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for example a direct bond, —0—, —S—, or —NR—; Y, inter alia is C-Calkylene; X is halogen; D is for example —0—, —S— or —NR—; D, inter alia is C-Calkylene; are particularly suitable as photolatent acids in ArF resist technology.