The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7399576 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 15, 2008

Filed:

Feb. 28, 2007
Applicant:

Moshe Levanon, Ness-Ziona, IL;

Inventor:

Moshe Levanon, Ness-Ziona, IL;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/016 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Radiation-sensitive compositions can be used to prepare imageable elements useful for example to make lithographic printing plates. The compositions include an aqueous alkaline solvent soluble phenolic resin or poly(vinyl acetal) as a polymeric binder. The compositions also include a fluorinated compound that has a urethane moiety and a fluorinated alkyleneoxy moiety to provide improved coating and friction properties particularly when stacked with interleaf papers. The radiation-sensitive composition can be coated as an imageable layer that further includes a radiation absorbing compound that is sensitive, for example, to infrared radiation.


Find Patent Forward Citations

Levanon, Moshe. (2008). Positive-working radiation-sensitive composition and elements (U.S. Patent No. 7399576). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7399576

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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