The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
May. 12, 2003
Michael C. Oborny, Albuquerque, NM (US);
Gregory C. Frye-mason, Cedar Crest, NM (US);
Ronald P. Manginell, Albuquerque, NM (US);
Michael C. Oborny, Albuquerque, NM (US);
Gregory C. Frye-Mason, Cedar Crest, NM (US);
Ronald P. Manginell, Albuquerque, NM (US);
Sandia Corporation, Albuquerque, NM (US);
Abstract
A microfabricated diffusion source to provide for a controlled diffusion rate of a vapor comprises a porous reservoir formed in a substrate that can be filled with a liquid, a headspace cavity for evaporation of the vapor therein, a diffusion channel to provide a controlled diffusion of the vapor, and an outlet to release the vapor into a gas stream. The microfabricated diffusion source can provide a calibration standard for a microanalytical system. The microanalytical system with an integral diffusion source can be fabricated with microelectromechanical systems technologies.