The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2008

Filed:

Dec. 02, 2005
Applicants:

Kun-hyung Lee, Sungnam-Si, KR;

Soo-woong Lee, Seoul, KR;

Hyun-ho Cho, Soowon-Si, KR;

Hee-sun Chae, Soowon-Si, KR;

Jae-hyung Jung, Yongin-Si, KR;

Sun-yong Lee, Seoul, KR;

Inventors:

Kun-Hyung Lee, Sungnam-Si, KR;

Soo-Woong Lee, Seoul, KR;

Hyun-Ho Cho, Soowon-Si, KR;

Hee-Sun Chae, Soowon-Si, KR;

Jae-Hyung Jung, Yongin-Si, KR;

Sun-Yong Lee, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65B 1/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.


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