The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 2008
Filed:
Jul. 05, 2006
Gernot Brasen, Mainz, DE;
Christian Laue, Mainz, DE;
Matthias Loeffler, Eisenberg, DE;
Heiko Theuer, Mainz, DE;
Gernot Brasen, Mainz, DE;
Christian Laue, Mainz, DE;
Matthias Loeffler, Eisenberg, DE;
Heiko Theuer, Mainz, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system and method for interferometric height measurement. A first coherent light beam and a second coherent light beam is generated. At least the first coherent light beam is reflected from a first region into a first return beam and the second coherent light beam is reflected from a second region into a second return beam. At least a first reflectivity of the first region is measured. A topography-dependent phase shift of the first return beam and the second return beam is determined with reference to a curve relating the first reflectivity to a material-dependent phase shift. A height based on the topography-dependent phase shift is measured.