The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2008

Filed:

Feb. 02, 2007
Applicants:

Satoshi Tomimatsu, Kokubunji, JP;

Kaoru Umemura, Musashino, JP;

Yuichi Madokoro, Kokubunji, JP;

Yoshimi Kawanami, Kokubunji, JP;

Yasunori Doi, Kokubunji, JP;

Inventors:

Satoshi Tomimatsu, Kokubunji, JP;

Kaoru Umemura, Musashino, JP;

Yuichi Madokoro, Kokubunji, JP;

Yoshimi Kawanami, Kokubunji, JP;

Yasunori Doi, Kokubunji, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for analyzing a semiconductor device, including: a first specimen fabricating apparatus including: a vacuum chamber in which a sample substrate is placed, an ion beam irradiating optical system for forming a specimen on the sample substrate, a specimen holder to mount the specimen, and a probe for removing the specimen from the sample substrate; a second specimen fabricating apparatus, and an analyzer to analyze the specimen, wherein said first specimen fabrication apparatus has a function to separate the specimen mounted on the specimen holder and the probe in a vacuum condition.


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