The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7396590 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 08, 2008

Filed:

Jul. 02, 2004
Applicant:

Kenneth Joseph Wynne, Richmond, VA (US);

Inventor:

Kenneth Joseph Wynne, Richmond, VA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/04 (2006.01); B32B 27/28 (2006.01); B32B 27/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

Polymers, and particularly conventional commodity bulk polymers, are modified to have a surface activity of interest using a surface modifying polymer that includes a moiety that favors migration to the surface of the bulk polymer together with a moiety provides the activity of interest (e.g., biocidal, wettability modifying (hydrophobic or hydrophilic), resistance to radiant energy, providing a functional group for functionalizing the surface, etc.). The surface modifying polymer is combined with the bulk polymer, and, due to the presence of the moiety that favors migration, concentrates primarily on the surface of the bulk polymer such that the moiety that provides the activity of interest is located primarily on the surface of the bulk polymeric article which is produced.


Find Patent Forward Citations

Wynne, Kenneth. (2008). Soft block with repeat units that favor migration to a surface and repeat units with an activity of interest, and polymeric articles or coatings using same (U.S. Patent No. 7396590). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7396590

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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