The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
May. 02, 2006
James J. Cordingley, Littleton, MA (US);
Jonathan S. Ehrmann, Sudbury, MA (US);
Joseph J. Griffiths, Winthrop, MA (US);
Shepard D. Johnson, Andover, MA (US);
Joohan Lee, Andover, MA (US);
Donald V. Smart, Boston, MA (US);
Donald J. Svetkoff, Ann Arbor, MI (US);
James J. Cordingley, Littleton, MA (US);
Jonathan S. Ehrmann, Sudbury, MA (US);
Joseph J. Griffiths, Winthrop, MA (US);
Shepard D. Johnson, Andover, MA (US);
Joohan Lee, Andover, MA (US);
Donald V. Smart, Boston, MA (US);
Donald J. Svetkoff, Ann Arbor, MI (US);
GSI Group Corporation, Billerica, MA (US);
Abstract
A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.