The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2008
Filed:
Oct. 20, 2005
Choong-un Kim, Arlington, TX (US);
Nancy L. Michael, Arlington, TX (US);
Jae-yong Park, Plano, TX (US);
Choong-Un Kim, Arlington, TX (US);
Nancy L. Michael, Arlington, TX (US);
Jae-Yong Park, Plano, TX (US);
Board of Regents, The University of Texas System, Austin, TX (US);
Abstract
The present invention provides for a system and method of characterizing the integrity of a barrier structure. The barrier structure is an interconnect comprising a porous dielectric layer sandwiched between at least one barrier layer and at least one conducting layer. The method of characterizing the integrity of such an interconnect includes providing an interconnect, infiltrating the interconnect with a solution comprising electrolytes, applying an external bias to the infiltrated interconnect, and characterizing the integrity of the interconnect after application of the external bias.