The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2008

Filed:

Sep. 16, 2004
Applicants:

Takatsugu Obata, Nara, JP;

Hisayuki Utsumi, Nara, JP;

Junichi Washo, Ikoma, JP;

Inventors:

Takatsugu Obata, Nara, JP;

Hisayuki Utsumi, Nara, JP;

Junichi Washo, Ikoma, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

To suppress generation of a joint when detaching an applicator roll and cylindrical substrate from each other in a simple control to form a coating film having a uniform thickness efficiently on the cylindrical substrate is provided. A coating liquid is supplied from a pan to an applicator roll via a metalling roll, the applicator roll supplied with the coating liquid and a cylindrical substrate provided so as to be close to or in contact with the applicator roll are rotated. The coating liquid is transferred from the applicator roll to the cylindrical substrate, and the cylindrical substrate is rotated in a predetermined number. Thereafter, such control is carried out that the circumferential speed Vof one of the applicator roll and the cylindrical substrate is higher than the circumferential speed Vof the other when detaching the applicator roll and the cylindrical substrate from each other.


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