The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7393159 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 01, 2008

Filed:

Jun. 07, 2004
Applicants:

Won-kie Chang, Seoul, KR;

Gi-cheon Yoon, Sungnam, KR;

Geun-soo an, Cheonan, KR;

Inventors:

Won-Kie Chang, Seoul, KR;

Gi-Cheon Yoon, Sungnam, KR;

Geun-Soo An, Cheonan, KR;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B65G 51/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An inline transfer system and method are provided for the secure transport and efficient processing of substrates such as glass substrates or semiconductor devices. A rotary conveyor is provided that includes a plurality of air nozzles which inject air to move a substrate above the plurality of air nozzles without the plurality of air nozzles making contact with the substrate. At least two independent processing units are operably coupled to the rotary conveyor. Advantageously, because a plurality of substrates may be processed in parallel, greater efficiency and flexibility are provided. Because the substrate can be moved without physical contact between the structure of the air nozzles and the substrate, the transfer is secure, clean, and efficient.


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