The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2008
Filed:
Jun. 13, 2006
Richard L. Kendrick, San Mateo, CA (US);
Eric H. Smith, San Jose, CA (US);
Richard L. Kendrick, San Mateo, CA (US);
Eric H. Smith, San Jose, CA (US);
Lockheed Martin Corporation, Bethesda, MD (US);
Abstract
Detecting the presence of a target material in a scene by using a multi-aperture interferometer system having a plurality of apertures at least one of which has an adjustable optical path length, by adjusting the aperture(s) to obtain a predetermined optical path length difference among the apertures, the predetermined optical path length difference being based on a source laser wavelength and a target material wavelength, illuminating the scene with the source laser, capturing a spectral data set corresponding to an interference pattern generated in the multi-aperture interferometer system for an illuminated point source in the scene, the spectral data set containing spatially distributed spectral data, and determining whether the target material is present at the illuminated point source based on a presence of spectral data in at least one side lobe of the spectral data set.