The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2008
Filed:
Mar. 03, 2004
Eckard Stroefer, Mannheim, DE;
Neven Lang, Mannheim, DE;
Ulrich Steinbrenner, Neustadt, DE;
Hans Hasse, Kaiserslautern, DE;
Michael Ott, Neckargemünd, DE;
Thomas Grützner, Stuttgart, DE;
Eckard Stroefer, Mannheim, DE;
Neven Lang, Mannheim, DE;
Ulrich Steinbrenner, Neustadt, DE;
Hans Hasse, Kaiserslautern, DE;
Michael Ott, Neckargemünd, DE;
Thomas Grützner, Stuttgart, DE;
BASF Aktiengesellschaft, , DE;
Abstract
Process for preparing high-concentration gaseous formaldehyde having a molar CHO:HO ratio of ≧0.6 from an aqueous formaldehyde solution by evaporation of at least part of the solution, in which the aqueous formaldehyde solution is heated to a vaporization temperature T and the gas phase formed is taken off, wherein the evaporation temperature T obeys the relationship:T[° C.]≧T'[° C.]where T′(c)=A+B×(c/100)+C×(c/100)+D×(c/100)andA=+68.759, B=+124.77, C=−12.851, D=−10.095,where c is the instantaneous CHO content of the aqueous formaldehyde solution during the evaporation in percent by weight and is from 20 to 99% by weight.