The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2008
Filed:
Aug. 18, 2004
Richard Wendell Foote, Jr., Kennedale, TX (US);
Richard Wendell Foote, Jr., Kennedale, TX (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
An oxidation process is used to produce a positional reference structure on a semiconductor wafer. A photolithographic mask layer used to define the positional reference structure can be combined with a photolithographic mask layer used to define an active device layer on the wafer, whereby both patterns can be printed in a single photolithographic operation. The same oxidation process used to produce an isolating oxide between active device regions of the active device layer can also be used to produce the positional reference structure.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile