The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 2008

Filed:

Aug. 04, 2005
Applicants:

Donald P. Spitzer, Stamford, CT (US);

Alan S. Rothenberg, Wilton, CT (US);

Howard I. Heitner, Stamford, CT (US);

Frank Kula, Danbury, CT (US);

Inventors:

Donald P. Spitzer, Stamford, CT (US);

Alan S. Rothenberg, Wilton, CT (US);

Howard I. Heitner, Stamford, CT (US);

Frank Kula, Danbury, CT (US);

Assignee:

Cytec Technology Corp., Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Materials and a method are provided whereby polymers with least 0.5 mole % of the pendant group or end group containing —Si(OR″)(where R″ is H, an alkyl group, Na, K, or NH) are used to control aluminosilicate scaling in an industrial process having an alkaline process stream such as a pulping mill process stream. When materials of the present invention are added to the alkaline process stream, they reduce and even completely prevent formation of aluminosilicate scale on equipment surfaces such as evaporator walls and heating surfaces. The present materials are effective at treatment concentrations that make them economically practical.


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