The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2008
Filed:
May. 12, 2005
Mark Leonard Malczewski, North Tonawanda, NY (US);
Douglas Charles Heiderman, Akron, NY (US);
Mark Leonard Malczewski, North Tonawanda, NY (US);
Douglas Charles Heiderman, Akron, NY (US);
Praxair Technology, Inc., Danbury, CT (US);
Abstract
Provided is a novel system and apparatus for producing primary standard gas mixtures. The system includes providing a gas permeation device having a constant diffusion rate into a temperature controlled enclosure; connecting a supply source of a component to the permeation device; routing the component from the gas permeation device to a product container until a desired amount of said component in the product container is reached; and supplying a balance of purified gas to the product container to obtain a known concentration of component in the primary standard gas mixture.