The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2008
Filed:
Dec. 21, 2006
Kimitoshi Etoh, Kanagawa, JP;
Kikuo Kusukawa, Saitama, JP;
Hisashi Kimura, Kanagawa, JP;
Tomohiro Okada, Kanagawa, JP;
Kimitoshi Etoh, Kanagawa, JP;
Kikuo Kusukawa, Saitama, JP;
Hisashi Kimura, Kanagawa, JP;
Tomohiro Okada, Kanagawa, JP;
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
Embodiments in accordance with the present invention relate to methods wherein when a main pole is processed by using an ion milling technique, a re-adhesion layer created on the side face of the resist mask is removed with certainty. In one embodiment, an inorganic insulator from 5 nm to 100 nm which is soluble in an alkaline is arranged between the main pole material and a mask for processing the main pole material, and the main pole is processed by ion milling. After this process, the mask is peeled off, a surface treatment is performed by using an alkaline solution, resulting in the re-deposition film being removed.