The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2008

Filed:

May. 28, 2004
Applicant:

Mei Chen, Mountain View, CA (US);

Inventor:

Mei Chen, Mountain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods, machines, and machine-readable media for computing dissimilarity measures are described. In one aspect, a first set of pixel neighborhood values (PNVs) is computed from respective sets of pixel values of a first image corresponding to different spatially-shifted pixel neighborhoods each encompassing a mutual target pixel in the first image. A second set of PNVs is computed from respective sets of pixel values of a second image corresponding to different spatially-shifted pixel neighborhoods each encompassing a mutual target pixel in the second image. A measure of dissimilarity is computed based at least in part on the first and second sets of computed PNVs. The computed dissimilarity measure is stored on a machine-readable medium.


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