The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
Aug. 26, 2004
Seong-bong Kim, Chungcheonnam-do, KR;
Seong-Bong Kim, Chungcheonnam-do, KR;
Samsung Electronics Co., Ltd., Chungcheonnam-Do, KR;
Abstract
An exposure mask and a method for divisional exposure are provided to advantageously reduce or eliminate stitch defects in displays. In one embodiment, an exposure mask comprises a masking panel and a slit for selectively transmitting light from a light source, the slit including a taper portion such that an area proximate the taper portion transmits less than full light intensity onto a substrate to be masked. In one example, the area proximate the taper portion is bounded between an inner corner and an outer corner of the taper portion. In a further example, the area proximate the taper portion transmits substantially one-half the light intensity onto the substrate to be masked. A method of divisional exposure utilizing the advantageous exposure mask is also disclosed.