The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2008

Filed:

Mar. 07, 2006
Applicants:

Alexei A. Erchak, Cambridge, MA (US);

Elefterios Lidorikis, Ioannina, GR;

Michael Lim, Cambridge, MA (US);

Nikolay I. Nemchuck, North Andover, MA (US);

JO A. Venezia, Sunnyvale, CA (US);

Inventors:

Alexei A. Erchak, Cambridge, MA (US);

Elefterios Lidorikis, Ioannina, GR;

Michael Lim, Cambridge, MA (US);

Nikolay I. Nemchuck, North Andover, MA (US);

Jo A. Venezia, Sunnyvale, CA (US);

Assignee:

Luminus Devices, Inc., Billerica, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Devices, such as light-emitting devices (e.g., LEDs), and methods associated with such devices are provided. A light-emitting device may include an interface including a first region and a second region. The first region having a dielectric function that varies spatially according to a first pattern, and the second region having a dielectric function that varies spatially according to a second pattern, wherein the second pattern is a rotation of the first pattern. A method of forming a light-emitting device is provided. The method comprises forming an interface comprising a first region and a second region. The first region having a dielectric function that varies spatially according to a first pattern, and the second region having a dielectric function that varies spatially according to a second pattern, wherein the second pattern is a rotation of the first pattern.


Find Patent Forward Citations

Loading…