The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
Sep. 23, 2005
Jeffrey S. Sullivan, Castro Valley, CA (US);
Jeffrey S. Sullivan, Castro Valley, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
We have developed a method of registration of a particle beam to internal alignment targets present within photoresist areas which are to be imaged. The method does not affect the photoresist, so the quality of pattern produced in the resist after imaging is not affected. The method used for registration of the particle beam to internal alignment targets also can be used to align a pattern in real time, while the pattern is being created, with the internal alignment targets. The real time alignment during creation of a pattern image in the photoresist can be used to correct for drift, or thermal expansion, or gravitational sag, by way of example.