The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2008

Filed:

Jun. 16, 2006
Applicants:

Chih-yu Chao, Taipei, TW;

Wen-jiunn Hsieh, Taipei County, TW;

Inventors:

Chih-Yu Chao, Taipei, TW;

Wen-Jiunn Hsieh, Taipei County, TW;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/18 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semi-closed observational environment for an electron microscope includes a housing having at least two spacers for partitioning itself into a receiving chamber, a gas chamber below the receiving chamber, a buffer chamber below the gas chamber, at least one gas inlet formed at the gas chamber, and at least one pumping port formed at the buffer chamber. The receiving chamber has at least two view holes formed at top and bottom sides thereof respectively, wherein the latter communicates with the gas chamber. The gas chamber has at least one gas aperture formed at a bottom side thereof for communication with the buffer chamber. The buffer chamber has at least one outer aperture formed at a bottom side thereof for communication with outside. The two view holes of the receiving chamber are coaxially aligned with the gas and outer apertures. A film is mounted to and seals the upper view hole.


Find Patent Forward Citations

Loading…