The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Mar. 21, 2005
Zongkai Wang, Port Washington, NY (US);
Shu Fang Han, New Hyde Park, NY (US);
Adam W. Divelbiss, Wappingers Falls, NY (US);
David C. Swift, Cortlandt Manor, NY (US);
Zongkai Wang, Port Washington, NY (US);
Shu Fang Han, New Hyde Park, NY (US);
Adam W. Divelbiss, Wappingers Falls, NY (US);
David C. Swift, Cortlandt Manor, NY (US);
Vrex, Inc., Hawthorne, NY (US);
Abstract
The invention is a method for creating a micropolarizer, including providing a first plate having a first and a second surface, providing a second plate having a first and a second surface. Then coating a polyimide on each of the first surface of the two plates followed by rubbing the polyimide coated upon the first surface of the first plate along a predetermined direction and rubbing the polyimide coated upon the first surface of the second plate along a direction having a predetermined angle in relation to the predetermined direction. An alignment process includes aligning the first plate and the second plate having the first surface of the first plate and the first surface of the second plate facing each other thereby creating a space there between. In conclusion there is a filling of a liquid crystal material in the space whereby a cell, or film is created.