The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Apr. 22, 2003
Applicants:
Guenther Hans Derra, Aachen, DE;
Ulrich Niemann, Aachen, DE;
Inventors:
Guenther Hans Derra, Aachen, DE;
Ulrich Niemann, Aachen, DE;
Assignee:
Koninklijke Philips Electronics, N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of generating extreme ultraviolet radiation, wherein the radiant medium is a plasma generated by processing a basic material, and the basic material distribution of the radiant medium consists at least of one halogenide of the metals lithium (Li), indium (In), tin (Sn), antimony (Sb), tellurium (Te), aluminum (Al) and/or a halogen 5 and/or an inert gas, with the exception of halogenides on the basis of lithium (Li) and chlorine (Cl) as well as fluorine (F).