The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Mar. 03, 2005
Ronald S. Cok, Rochester, NY (US);
Michael L. Boroson, Rochester, NY (US);
Timothy J. Tredwell, Fairport, NY (US);
Andrea S. Rivers, Bloomfield, NY (US);
Dustin L. Winters, Webster, NY (US);
Ronald S. Cok, Rochester, NY (US);
Michael L. Boroson, Rochester, NY (US);
Timothy J. Tredwell, Fairport, NY (US);
Andrea S. Rivers, Bloomfield, NY (US);
Dustin L. Winters, Webster, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
An apparatus and method for forming vias in one or more layers, comprising one or more beams located in alignment with the layers for forming one or more vias in one or more areas of the layers. A vacuum mechanism is provided for collecting ablated material caused by the directed beams forming the one or more vias, the vacuum mechanism being in fixed alignment with respect to the one or more beams such that the vacuum applies a removal force on the ablated material at the time and location when the one or more vias is being formed.