The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Jul. 19, 2006
Song Jin, Laramie, WY (US);
Paul H. Fallgren, Laramie, WY (US);
Song Jin, Laramie, WY (US);
Paul H. Fallgren, Laramie, WY (US);
The University of Wyoming Research Corporation, Laramie, WY (US);
Abstract
Systems and methods for co-enhancing contaminant degradation such as LNAPL and DNAPL degradation. Embodiments of the inventive technology may relate to assuring adequate amounts (e.g., concentrations) of certain substances (e.g., nitrogen, electron acceptor, bacteria, microbial substrate) so that degradation of LNAPL and DNAPL is enhanced as intended. Any of the inventive methods may involve the amendment of groundwater with one or more particular substance (uric acid, electron acceptors, microbial substrate, as but a few examples) in order to enhance DNAPL, and perhaps also, LNAPL degradation.