The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 10, 2008

Filed:

Dec. 06, 2002
Applicants:

Alan Pittaway, Bucks, GB;

Surinderjit Kumar Jassell, Middlesex, GB;

Simon Robert Payne, Surrey, GB;

Inventors:

Alan Pittaway, Bucks, GB;

Surinderjit Kumar Jassell, Middlesex, GB;

Simon Robert Payne, Surrey, GB;

Assignee:

Intersurgical AG, Vaduz, LI;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16T 1/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

A water trap suitable for use in a mechanical ventilation circuit comprising a cap with an inlet and an outlet, a fluid collection vessel engageable with the cap, and a rotatable closure with at least one aperture interposed between the cap and the vessel. The vessel is operably linked to the closure such that engagement or disengagement of the vessel from the cap causes the closure to be rotated. The cap is formed with an internal partition extending into abutment with the closure to define a chamber via which the inlet and outlet are in fluid communication and the closure forming a base of the chamber. When the vessel is engaged with the cap, the closure has a first orientation in which the at least one aperture is located within the periphery of the skirt in the base of the chamber and the vessel is in communication with the chamber via the at least one aperture. When the vessel is removed from the cap the closure is rotated to a second orientation in which the at least one aperture is located externally of the periphery of the skirt and the base of the chamber.


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