The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Feb. 01, 2005
Arnab Sarkar, West Hills, CA (US);
Bedros Orchanian, North Hills, CA (US);
Arnab Sarkar, West Hills, CA (US);
Bedros Orchanian, North Hills, CA (US);
Nextrom Oy, , CH;
Abstract
An outside chemical vapor deposition apparatus is disclosed for depositing porous glass-forming material onto a target rod to form a cylindrical body, with substantially higher efficiency than could prior apparatus. The apparatus includes two separate burner arrays, one array optimized for depositing the material during an initial stage of the process, when the cylindrical body has a relatively small diameter, and the other array optimized for depositing the material during a later stage of the process, when the cylindrical body has a relatively large diameter. In addition, each burner array can include a plurality of burners, with each burner azimuthally angled relative to the apparatus' air-flow axis, and with adjacent burners angled in opposite directions relative to that axis, to minimize the density gradient within the deposited porous material.