The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2008

Filed:

Jan. 31, 2005
Applicants:

Mary Frances Doerner, Santa Cruz, CA (US);

Eric Edward Fullerton, Morgan Hill, CA (US);

Wen-yaung Lee, San Jose, CA (US);

Jinshan LI, San Jose, CA (US);

Brian R. York, San Jose, CA (US);

Inventors:

Mary Frances Doerner, Santa Cruz, CA (US);

Eric Edward Fullerton, Morgan Hill, CA (US);

Wen-yaung Lee, San Jose, CA (US);

Jinshan Li, San Jose, CA (US);

Brian R. York, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/39 (2006.01);
U.S. Cl.
CPC ...
Abstract

A magnetic head having a free layer and an antiparallel (AP) pinned layer structure spaced apart from the free layer. The AP pinned layer structure includes at least two pinned layers having magnetic moments that are self-pinned antiparallel to each other, the pinned layers being separated by an AP coupling layer constructed of a Ru alloy. The use of a Ru alloy coupling layer significantly increases the pinning field of the AP pinned layer structure over a pure Ru spacer.


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