The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Oct. 06, 2006
Jan Thirase, Goettingen, DE;
Bruene Venus, Goettingen, DE;
Jan Thirase, Goettingen, DE;
Bruene Venus, Goettingen, DE;
Carl Zeiss MicroImaging GmbH, Jena, DE;
Abstract
A method by which the illumination radiation to be coupled into the illumination beam path of a microscope can be exactly monitored and/or adjusted. In the method for adjusting a light source for a microscope, an imaging optical reflection unit, instead of the objective, is coupled to the microscope in order to image the light of the light source on a detector in such a way that a monitoring of the focus position and/or the position and/or an adjustment of the laser light source with respect to the focus position and/or the position can be carried out. Provided is an approach for monitoring and adjusting a laser beam to be coupled into the illumination beam path of a microscope particularly for using TIRF effects. It can also be used in principle for other solutions in which the parallelism of illumination beams must be monitored and/or adjusted.