The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2008
Filed:
Apr. 03, 2006
Ryosuke Tsutsumi, Utsunomiya, JP;
Ryosuke Tsutsumi, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus which irradiates a photosensitive agent applied to a substrate to form a latent image pattern on the photosensitive agent. The exposure apparatus includes a substrate stage which drives the substrate, a focus measurement unit which obliquely irradiates the substrate with measurement light to measure the position of the substrate in the direction of the axis of the exposure beam on the basis of the light reflected by the substrate, and a controller which executes a calibration for correcting, on the basis of the measurement result obtained by the focus measurement unit, a track plane of the substrate stage with reference to the reference plane of the focus measurement unit so as to set the track plane parallel to the reference plane.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile